高熵氧化物是一种由高构型熵稳定的新型材料, 有望具有独特的电化学性能。采用聚丙烯酰胺凝胶法制备了(Mg0.2Co0.2Ni0.2Cu0.2Zn0.2)O纳米粉体并研究了其超级电容性能。结果表明: 单相(Mg0.2Co0.2Ni0.2Cu0.2Zn0.2)O纳米粉体的制备温度随着丙烯酰胺/金属阳离子摩尔比的增加而降低。当丙烯酰胺/金属阳离子摩尔比为120:1时, 在900 ℃煅烧2 h所制备的岩盐相高熵纳米粉体呈现出球形形态, 粒径为40~65 nm。该高熵纳米粉体在1 A/g的电流密度下具有402 F/g的比电容; 当电流密度增大到20 A/g时, 仍然能保持62%的初始比电容; 在电流密度为5 A/g时, 经过2 000次充放电循环后, 电容保持率为61%, 该研究表明高熵(Mg0.2Co0.2Ni0.2Cu0.2Zn0.2)O纳米粉体在超级电容器电极材料领域具有良好的应用前景。Its Electrochemical Properties As Supercapacitor Electrode

测试了应用于神光Ⅱ系列装置93片N31型钕玻璃的小信号增益系数。结果表明，Nd2O3质量分数为2.2%的钕玻璃平均小信号增益系数为0.0387 cm-1，Nd2O3质量分数为3.0%的钕玻璃平均小信号增益系数为0.0416 cm-1，两种浓度的钕玻璃不同样品间小信号增益系数的起伏范围分别为0.86%和0.76%。根据所测定的增益值，表明N31型钕玻璃的增益起伏符合神光Ⅱ系列装置要求，为实现该装置中每一路增益性能的平衡提供了有力保障，也为今后对更大尺寸钕玻璃增益性质的控制提供了经验。

Experimental investigation was performed with a 1064-nm, 10-ns Nd:YAG laser to determine the effects of the surface hydrogen acid etching on laser damage, compared with damage of conventionally polished surface. The investigation was helpful for us to understand the negative effects of Nd-doped phosphate glass surface and subsurface damage (SSD) on laser induced damage threshold (LIDT). A set of samples was polished, and then chemically etched in a cool buffered 10%HF + 20%H2SO4 solution at different times. Another set of samples was ground and etched in the hot-buffered solution, and then polished. All the samples were irradiated with Nd: YAG laser and characterized by optical microscopy. Results of LIDT were obtained according to International standard ISO/DIS 11254-1.2. Chemical treatment can remove the contaminants in the polished re-deposition layer and the SSD for improving the laser damage resistance of Nd-doped phosphate glass surfaces. The method of using hot solution was more effective than that of using cool solution.

The system for effective area measurement of laser spot on target plane was designed based on the definition of effective area. A 12-bit CCD camera is used for the effecive area measurement. A bmp image of the beam profile is stored. This image is processing by software to evaluate the ratio of total energy and peak fluence (effective area). Some test results were given using effective area measurement system. The system was employed in the laser induced damage threshold test and it is helpful to improving the precision of laser induced damage threshold test.

从激光光斑有效面积的定义出发,采用CCD图像摄取技术,设计了一套激光光斑有效面积测量装置.在4种不同激光光斑能量分布和不同能量密度的情况下,用有效面积测量仪分别进行了实际测试验证.结果表明,该测量装置可以对任何能量非均匀分布的激光光斑的有效面积进行准确测试,有助于提高光学元件激光损伤阈值的测量精度.

Nd∶doped-glass-based sub-picosecond laser system with the maximum peak power of greater than 20 tara watts and the energy on target surface of 16 J is accomplished by using the chirped laser pulse amplification technology. While the laser pulse is focused by an off-axis parabolic mirror, the power density on target surface of approximately 2×10 18 W/cm 2 is acquired. In the performed neutron experiment, a C 8D 8 plate target is placed on the focal spot of the off-axis parabolic mirror. The maximum neutron yield for a single shot reaches 2.4×10 4. Still some other related problems are discussed

A high power laser system delivering a 20-TW, 0.5 - 0.8 ps ultra-short laser pulse and a 20-J, 500-ps long pulse simultaneously in one shot is completed. This two-beam laser operates at the wavelength of 1053 nm and uses Nd doped glass as the gain media of the main amplification chain. The chirped-pulse amplification (CPA) technology is used to compress the stretched laser pulse. After compression, the ultrashort laser pulse is measured: energy above 16.0 J, S/N contrast ratio ~ 10^(5) : 1, filling factor ~>52.7%. Another long pulse beam is a non-compressed chirped laser pulse, which is measured: energy ~ 20 J, pulse duration 500 ps. The two beams are directed onto the target surface at an angle of 15°.

利用啁啾脉冲放大技术，建成了一台基于钕玻璃放大器1053 nm波长的亚皮秒超短脉冲激光系统(SPS)。系统的输出峰值功率大于20 TW，靶面最高能量可达16 J，采用离轴抛物面反射镜聚焦，在靶面上获得2×10 18 W/cm 2的激光功率密度，以此激光脉冲轰击氘化聚苯乙烯平面靶，获得单次发射最高2.4×10 4个中子产额。对中子产生的机理进行了相关的讨论。

A high power laser system delivering a 20-TW, 0.5 - 0.8 ps ultra-short laser pulse and a 20-J, 500-ps long pulse simultaneously in one shot is completed. This two-beam laser operates at the wavelength of 1053 nm and uses Nd doped glass as the gain media of the main amplification chain. The chirped-pulse amplification (CPA) technology is used to compress the stretched laser pulse. After compression, the ultrashort laser pulse is measured: energy above 16.0 J, S/N contrast ratio ~ 10^(5) : 1, filling factor ~>52.7%. Another long pulse beam is a non-compressed chirped laser pulse, which is measured: energy ~ 20 J, pulse duration 500 ps. The two beams are directed onto the target surface at an angle of 15°.